Semiconductor Equipment – FEOL Photolithography
Build equipment that maximizes throughput and yield, using cutting-edge optical and mechanical materials and components.
- Extreme Stability Build wafer processing tools with components based on thermally innovative materials.
- Durable Materials Benefit from longer-lived optics such as polycrystalline CVD diamond windows.
- Tighter Tolerances Benefit from the flattest wafer tables based on reaction bonded silicon carbide (RB SiC).
Extreme ultraviolet (EUV) lithography can deliver IC features down to 5 nm and beyond. But reaching this resolution puts high demands on every part of a lithography system, in terms of vibrational stability, thermal creep, and wafer table flatness. Coherent has pioneered the use of innovative materials - including hybrid ceramics and silicon carbides - to create mechanical and optomechanical components with the performance to match these requirements. We also provide optics to handle the unique demands of EUV radiation.
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