Pulsed Laser Deposition (PLD) 

Perform Pulsed Laser Deposition (PLD) with our uniquely powerful excimer lasers. 


  • Stoichiometric PLD Use our rugged COMPex lasers for stoichiometric PLD results.
  • Large Area PLD Our high-power LEAP lasers deliver large areas of high performance thin films.
  • Three-shift PLD Benefit from uptime and longevity offered by our field-proven excimer lasers.
PLD Pulsed Laser Deposition

Video Spotlight: High-Power Excimer Lasers for Thin Film Equipment at Solmates, Enschede

Using high-power, LEAP series excimer lasers, Arjen Janssens and colleagues at company Solmates, Enschede, The Netherlands develop innovative pulsed laser deposition equipment which will play a key role in the development of future chip designs and the integration of new thin-film materials. Learn more about laser technology in thin-film industries.

 

Featured Blog

Innovating MicroLED Display Manufacturing

Coherent's new UVtransfer systems is innovating MicroLED manufacturing with Laser Lift-Off (LLO), Laser-Induced Forward Transfer (LIFT), and repair/trimming.

MicroLED Image

Customer

Success Stories

LEAP excimer lasers minimize the true cost per laser watt and enable lower-cost, high-volume production of HTS wire at S-Innovations.
Dr. Alexander Molodyk CEO, S-Innovations, Moscow, Russia

High Volume Production of Superconducting Wire/tape Using an Excimer Laser

S-Innovations (Moscow, Russia) delivered the highest ever volume of superconducting YbCO tape using a Coherent LEAP 300C excimer to power their pulsed laser deposition (PLD) process.

Amplifier thermal stability is critical. Our chamber runs at up to 950°C internally and heats the lab significantly during long experiments. The power, beam shape, and pointing of Astrella are all unaffected by these ambient changes.
Dr. Morgan Trassin ETH Zürich, Zürich, Switzerland

Amplifier Stability Enables in-situ Studies of Ferroelectric Film Polarization

See how researchers successfully used Coherent Astrella/TOPAS to determine both the degree and direction of polarization, in films from zero to 20 unit cells (u.c.).

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