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Coherent
Line Beam
Line Beam

LineBeam

Large Format Polysilicon Annealing

Demand is rising for high definition and power efficient low-temperature polysilicon (LTPS) display backplanes to be the foremost differentiator for mobile devices such as smartphones and tablets. LineBeam systems from Coherent are the enabling technology for mass manufacturing LTPS backplanes on large substrate panels with the highest yield.

Line Beam Optical System

308 nm excimer laser annealing enables market growth of faster, brighter, thinner and more lightweight AM-LCD and AM-OLED flat panel devices relying on high electron mobility.

Applications

Application
Process
Material

Excimer Laser Annealing
Surface Modification
Semiconductor

Features & Benefits


LineBeam Model
LineBeam 750
LineBeam 1000
LineBeam 1300
LineBeam 1500
Wavelength (nm)
308
308
308
308
Energy Density (mJ/cm2)
390
395
395
435
Line Beam Length (mm)
750
1000
1300
1500
Line Beam Width (µm)
440
660
510
550
Long Axis Homogeneity (%, 2 sigma)
1.4
1.8
1.8
1.8
Short Axis Steepness (µm)
125
125
125
125
Depth of Focus (µm)
±150
±120
±120
±120

LineBeam Key Features
308 nm wavelength for high yield OLED and LCD polysilicon annealing
Superior pulse stability and high depth of field to ensure a large process window
Short and long axis beam homogeneity for maximum throughput and beam utilization
Proven performance in leading large-scale OLED and LCD fabs

Please Read Before Continuing

Risk factors: Except for the historical information contained here, many of the matters discussed in this Web site are forward-looking statements, based on expectations at the time they were made, that involve risks and uncertainties that could cause our results to differ materially from those expressed or implied by such statements. These risks are detailed in the “Factors That May Affect Future Results” section of our latest 10-K or 10-Q filing. Coherent assumes no obligation to update these forward-looking statements.


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